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Characterization of p-type wide band gap transparent oxide for heterojunction devices
Applied sciences Pure sciences Transparent oxide films Wide band gap semiconductors Transparent oxide Heterojunction devices
2014/11/7
Transparent p-type CuCr1-x Mgx O2 wide band gap oxide semiconductor thin films were deposited over quartz substrates by chemical spray pyrolysis technique using metalloorganic precursors. A mechanism ...
Properties of transparent oxide thin films prepared by plasma deposition
transparent thin film sputtering process titanium oxide hot target
2011/4/27
In this paper, thin films of TiO2 were deposited onto (100) oriented silicon and glass substrates using low pressure hot target reactive magnetron sputtering (LP HTRS) method. X-ray diffraction (XRD) ...